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Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

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Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Brand Name : ZEIT

Model Number : MSC700-750-700

Certification : Case by case

Place of Origin : Chengdu, P.R.CHINA

MOQ : 1set

Price : Case by case

Payment Terms : T/T

Supply Ability : Case by case

Delivery Time : Case by case

Packaging Details : Wooden case

Weight : 2500±200KG, Customizable

Size : 2800mm*1000mm* 2300mm, Customizable

Vertical magnetic recording film : CoCr

Target Material : 4x4 inches (compatible with 4 inches and below)

Process Gas : Ar, N2, O2

Coating thickness : ≥10nm

Substrate carrier : With planetary rotation mechanism

Model : MSC700-750-700

Brand : ZEIT

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Dielectric Films Optical Coating Equipment Ar N2 O2 PVD Magnetron Sputtering Deposition

Applications

Applications Specific Purpose Material Type
Semiconductor IC, LSI electrode, wiring film AI, Al-Si, Al-Si-Cu, Cu, Au, Pt, Pd, Ag
VLSI memory electrode Mo, W, Ti
Diffusion barrier film MoSix, Wsix, TaSix,, TiSx, W, Mo, W-Ti
Adhesive film PZT(Pb-ZrO2-Ti) , Ti, W
Display Transparent conductive film ITO(In2O; -SnO2)
Electrode wiring film Mo, W, Cr, Ta, Ti, Al, AlTi, AITa
Electroluminescent film

ZnS-Mn, ZnS-Tb, CaS-Eu, Y2O3, Ta2O5,

BaTiO3

Magnetic recording Vertical magnetic recording film CoCr
Film for hard disk CoCrTa, CoCrPt, CoCrTaPt
Thin film magnetic head CoTaZr, CoCrZr
Artificial crystal film CoPt, CoPd
Optical recording Phase change disc recording film TeSe, SbSe, TeGeSb, etc
Magnetic disk recording film

TbFeCo, DyFeCo, TbGdFeCo,

TbDyFeCo

Optical disc reflective film AI, AITi, AlCr, Au, Au alloy
Optical disc protection film Si3N4, SiO2+ZnS
Perovskite thin-film battery Transparent conducting layer ZnO:Al
Medical treatment Biocompatible materials Al2O3, TiO2
Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films
Anti-discoloration coating Precious metal anti-oxidation coating Al2O3, TiO2
Optical films High-low refractive index SiO2, TiO2, Ta2O5, ZrO₂, HfO2
Other applications Lightproof film Cr, AlSi, AlTi,etc
Resistive film NiCrSi, CrSi, MoTa, etc
Superconducting film YbaCuO, BiSrCaCuo
Magnetic film Fe, Co, Ni, FeMn, FeNi, etc

Features

Model MSC700-750-700
Coating type Various dielectric films such as metal film, metal oxide and AIN
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size 700mm*750mm*700mm (Customizable)
Background vacuum <5×10-7mbar
Coating thickness ≥10nm
Thickness control precision ≤±3%
Maximum Coating Size ≥100mm (Customizable)
Film thickness uniformity ≤±0.5%
Substrate carrier With planetary rotation mechanism
Target Material 4x4 inches (compatible with 4 inches and below)
Power Supply The power supplies such as DC, pulse, RF, IF and bias are optional
Process Gas Ar, N2, O2
Note: Customized production available.

Process Steps

→ Place the substrate for coating into the vacuum chamber;

→ Roughly vacuumize;

→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;

→ Heating the vacuum chamber until the temperature reaches the target;

→ Implement the constant temperature control;

→ Clean elements;

→ Revolve and back to the origin;

→ Coating film according to process requirements;

→ Lower temperature and stop the pump assembly after coating;

→ Stop working when the automatic operation is finished.

Coating Sample

Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Working Principle

Magnetron sputtering is a kind of Physical Vapor Deposition (PVD). It makes the electrons move in spiral

paths near the target surface by the interaction between magnetic and electric fields, thus increasing the

probability of electrons hitting argon gas to generate ions.The generated ions then hit the target surface

under the action of electric field and sputter the target materials to deposite thin film on the substrate surface.

The general sputtering method can be used for preparation of various metals, semiconductors, ferromagnetic

materials, as well as insulated oxides, ceramics and other substances. The equipment uses PLC+ touch

panel HMI control system, which can enter parameters by programmable process interface, with the functions

such as single target sputtering, multi-target sequential sputtering and co-sputtering.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Parts Of Our Patents

Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition MachineDielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Parts Of Our Awards

Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition MachineDielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

At ZEIT Group, we solve all your concerns through offering superior customized service, being a trusted partner and providing unmatched technology solutions. Our certified field services engineers provide global support for around-the-clock coverage that keeps your R&D or manufacturing goals on track.

Around The Clock and Around the World Coverage
  • Global technical support experts to manage product escalations and solve issues quickly.
  • Spare parts coupled with a global footprint, all-weather response and fast delivery.
  • Availability of installation and debugging.
Improve and Extend Your Capabilities
  • Refurbish and repair programs locally to lower your cost of ownership and decrease turn around times.
  • Resource sharing to extend your current business.
Comprehensive Coverage by Best-in-Class Field Service Engineers
  • Performance guarantee programs such as guaranteed cost or uptime.
  • Production support programs to cover your tool or fleet for any issue with our proactive staffing and parts planning.

Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine


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