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TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

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TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

Name: TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO
Brand: ZEIT
Price: 1 USD

Brand Name : ZEIT

Model Number : ALD1200-500

Certification : Case by case

Place of Origin : Chengdu, P.R.CHINA

MOQ : 1set

Price : Case by case

Payment Terms : T/T

Supply Ability : Case by case

Delivery Time : Case by case

Packaging Details : Wooden case

Weight : 350±200KG, Customizable

Size : 1900 mm*1200mm*2000mm, Customizable

Customizable : Available

Guarantee period : 1 year or case by case

Shipping Terms : By Sea / Air / Multimodal Transport

Coating film system : AL2O3, TiO2, ZnO, etc

Coating size : 200×200mm² / 400×400mm² / 1200×1200 mm², etc

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ALD Atomic Layer Deposition

Applications

Applications	Specific Purpose	ALD Material Type
MEMS devices	Etching barrier layer	Al₂O₃
	Protective layer	Al₂O₃
	Anti-bonding layer	TiO₂
	Hydrophobic layer	Al₂O₃
	Bonding layer	Al₂O₃
	Wear-resistant layer	Al₂O₃, TiO₂
	Anti-short circuit layer	Al₂O₃
	Charge dissipation layer	ZnO: Al
Electroluminescent display	Luminous layer	ZnS: Mn / Er
Electroluminescent display	Passivation layer	Al₂O₃
Storage materials	Ferroelectric materials	HfO₂
	Paramagnetic materials	Gd₂O₃, Er₂O₃, Dy₂O₃, Ho₂O₃
	Non-magnetic coupling	Ru, Ir
	Electrodes	Precious metals
Inductive coupling (ICP)	High-k gate dielectric layer	HfO₂, TiO₂, Ta₂O₅, ZrO₂
Crystalline silicon solar battery	Surface passivation	Al₂O₃
Perovskite thin-film battery	Buffer Layer	ZnxMnyO
Perovskite thin-film battery	Transparent conducting layer	ZnO: Al
3D packaging	Through-Silicon-Vias (TSVs)	Cu, Ru, TiN
Luminous application	OLED passivation layer	Al₂O₃
Sensors	Passivation layer, filler materials	Al₂O₃, SiO₂
Medical treatment	Biocompatible materials	Al₂O₃, TiO₂
Corrosion protection layer	Surface corrosion protection layer	Al₂O₃
Fuel battery	Catalyst	Pt, Pd, Rh
Lithium battery	Electrode material protection layer	Al₂O₃
Hard disk read/write head	Passivation layer	Al₂O₃
Decorative coating	Colored film, metallized film	Al₂O₃, TiO₂
Anti-discoloration coating	Precious metal anti-oxidation coating	Al₂O₃, TiO₂
Optical films	High-low refractive index	MgF₂, SiO₂, ZnS, TiO₂, Ta₂O₅, ZrO₂, HfO₂

Working Principle

Atomic layer deposition (ALD) is a method of depositing the substances on the surface of substrate in the

form of single atomic film layer by layer. Atomic layer deposition is similar to common chemical deposition,

but in the process of atomic layer deposition, the chemical reaction of a new layer of atomic film is directly

associated with the previous layer, so that only one layer of atoms is deposited in each reaction by this method.

Features

Model	ALD1200-500
Coating film system	AL₂O_3,TiO_2,ZnO, etc
Coating temperature range	Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size	Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure	According to customer’s requirements
Background vacuum	<5×10^-7mbar
Coating thickness	≥0.15nm
Thickness control precision	±0.1nm
Coating size	200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity	≤±0.5%
Precursor and Carrier Gas	Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water, nitrogen, etc. ( C₃H₉Al, TiCl4, C₄HZn,H₂O,N₂, etc.)
Note: Customized production available.

Coating Samples

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and

cooling is completed, then take out the substrate after the vacuum breaking conditions are met.

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TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

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